caa a22 4500 463233549 CHVBK 20180405153249.0 cr unu---uuuuu 170326e20070601xx s 000 0 eng 10.1007/s10853-006-0189-2 doi (NATIONALLICENCE)springer-10.1007/s10853-006-0189-2 Interface characteristics in diffusion bonding of a γ-TiAl alloy to Ti-6Al-4V [Elektronische Daten] [Xiu Wang, Mo Ma, Xue Liu, Jian Lin] In the present study, diffusion bonding of a γ-TiAl alloy to a Ti-6Al-4V alloy at the different temperatures ranging from 1073 to 1173K under an applied stress of 100MPa for 2h was investigated. The observation of the microstructure revealed that sound joints between the γ-TiAl Alloy and the Ti-alloy without any pores or cracks could be achieved through diffusion bonding at temperatures over 1073K under the applied stress of 100MPa for 2h. The bond was composed of two zones, and its width increases with the increase of the bonding temperature. The EDS chemical composition profiles indicated that there is a diffusion flux of Al-atoms from γ-TiAl alloy towards the Ti-alloy and of Ti-atoms in the opposite direction. The microhardness of the diffusion bond was in the range of 310-450HV, and increased monotonously from the side near the γ-TiAl alloy to the side near the Ti-alloy. In this bonding process, the diffusion flux of Ti atoms in interface is mainly controlled by grain boundary diffusion. Springer Science+Business Media, LLC, 2007 Wang Xiu Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut Ma Mo Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut Liu Xue Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut Lin Jian Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/11(2007-06-01), 4004-4008 0022-2461 42:11<4004 2007 42 10853 https://doi.org/10.1007/s10853-006-0189-2 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-0189-2 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Wang Xiu Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut NATIONALLICENCE 700 1- Ma Mo Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut NATIONALLICENCE 700 1- Liu Xue Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut NATIONALLICENCE 700 1- Lin Jian Faculty of Material & Photoelectronic Physics, Xiangtan University, 411105, Xiangtan, Hunan, P.R. China aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/11(2007-06-01), 4004-4008 0022-2461 42:11<4004 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer