caa a22 4500 463234316 CHVBK 20180405153252.0 cr unu---uuuuu 170326e20070801xx s 000 0 eng 10.1007/s10853-006-1152-y doi (NATIONALLICENCE)springer-10.1007/s10853-006-1152-y Growth behavior and surface topography of different silane coupling agents adsorbed on the silicon dioxide substrate (0001) for vapor phase deposition [Elektronische Daten] [Chujiang Cai, Zhigang Shen, Shulin Ma, Yushan Xing] The growth behavior and surface topography of the deposited films formed from silane coupling agents on silicon dioxide substrate (0001) via vapor phase deposition was investigated using atomic force microscopy (AFM). The surface topography of the films adsorbed on the silicon dioxide substrates is dissimilar with different silane coupling agents and different deposition conditions: (1) the films adsorbed on the silicon dioxide substrate become smoother with the increasing temperature of the silicon dioxide substrate; (2) the surface roughness of the films increases with the increasing concentration of the silane coupling agent solutions; (3) with the increasing temperature of the carrier gas, the surface roughness of the films decreases firstly and then increases; (4) with the increasing time of deposition, the surface roughness of the films increases firstly, then decreases and subsequently increases again. In experiments, the films adsorbed on the silicon dioxide substrate was rinsed ultrasonically with toluene, the results indicate that the silane coupling agent adsorbed on the substrate by physisorption and chemisorption: the chemisorbed coupling agents present island morphology and the physisorbed coupling agents are deposited on the substrate between the islands to decrease the surface roughness of the film. Springer Science+Business Media, LLC, 2007 Cai Chujiang Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut Shen Zhigang Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut Ma Shulin Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut Xing Yushan Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/15(2007-08-01), 6108-6116 0022-2461 42:15<6108 2007 42 10853 https://doi.org/10.1007/s10853-006-1152-y text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s10853-006-1152-y text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Cai Chujiang Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut NATIONALLICENCE 700 1- Shen Zhigang Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut NATIONALLICENCE 700 1- Ma Shulin Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut NATIONALLICENCE 700 1- Xing Yushan Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, 100083, Beijing, P.R. China aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers-Plenum Publishers; http://www.springer-ny.com 42/15(2007-08-01), 6108-6116 0022-2461 42:15<6108 2007 42 10853 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer