caa a22 4500 465731384 CHVBK 20180323111742.0 cr unu---uuuuu 170327e19900701xx s 000 0 eng 10.1007/BF02165076 doi (NATIONALLICENCE)springer-10.1007/BF02165076 Separation of iron from semiconductor grade silicon in activation analysis [Elektronische Daten] [H. Jaskólska, L. Waliś] A method of separation of iron from silicon for use in the neutron activation analysis has been developed. Iron was separated by extraction with N-benzoyl-N-phenylhydroxylamine /HBPHA/ from 0.4N HCl solution followed by extraction at pH=3.0. The lower limit of determination was 9.9×10−9 g. Akadémiai Kiadó, 1990 Jaskólska H. Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195, Warszawa, Poland aut Waliś L. Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195, Warszawa, Poland aut Journal of Radioanalytical and Nuclear Chemistry Kluwer Academic Publishers 145/5(1990-07-01), 355-360 0236-5731 145:5<355 1990 145 10967 https://doi.org/10.1007/BF02165076 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02165076 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Jaskólska H. Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195, Warszawa, Poland aut NATIONALLICENCE 700 1- Waliś L. Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195, Warszawa, Poland aut NATIONALLICENCE 773 0- Journal of Radioanalytical and Nuclear Chemistry Kluwer Academic Publishers 145/5(1990-07-01), 355-360 0236-5731 145:5<355 1990 145 10967 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer