caa a22 4500 467914044 CHVBK 20180406152857.0 cr unu---uuuuu 170328e20061001xx s 000 0 eng 10.1007/s00450-006-0017-6 doi (NATIONALLICENCE)springer-10.1007/s00450-006-0017-6 Quantum lithography: Anon-computing application of quantum information [Elektronische Daten] [Colin Williams, Pieter Kok, Hwang Lee, Jonathan Dowling] Quantum information theory holds the promise of revolutionizing technologies other than computing and communications. In this article we show how quantum entanglement can be harnessed to beat the Rayleigh diffraction limit of conventional optical lithography, and to permit nano-devices to be fabricated at ascale arbitrarily shorter than the wavelength used. Given the relative ease of performing optical lithography compared with other schemes, and the relative costs associated in migrating the lithography industry to each new fabrication technology, exploiting quantum entanglement to extend the useful life of optical lithography could be economically attractive. Springer-Verlag, 2006 Williams Colin Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109-8099, Pasadena, CA, USA aut Kok Pieter Department of Materials, Oxford University, Oxford University Parks Road, OX1 3PH, Oxford, UK aut Lee Hwang Department of Physics & Astronomy, Louisiana State University, 202 Nicholson Hall, Tower Drive, 70803-4001, Baton Rouge, LA, USA aut Dowling Jonathan Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109-8099, Pasadena, CA, USA aut Informatik - Forschung und Entwicklung Springer-Verlag 21/1-2(2006-10-01), 73-82 0178-3564 21:1-2<73 2006 21 450 https://doi.org/10.1007/s00450-006-0017-6 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s00450-006-0017-6 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Williams Colin Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109-8099, Pasadena, CA, USA aut NATIONALLICENCE 700 1- Kok Pieter Department of Materials, Oxford University, Oxford University Parks Road, OX1 3PH, Oxford, UK aut NATIONALLICENCE 700 1- Lee Hwang Department of Physics & Astronomy, Louisiana State University, 202 Nicholson Hall, Tower Drive, 70803-4001, Baton Rouge, LA, USA aut NATIONALLICENCE 700 1- Dowling Jonathan Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109-8099, Pasadena, CA, USA aut NATIONALLICENCE 773 0- Informatik - Forschung und Entwicklung Springer-Verlag 21/1-2(2006-10-01), 73-82 0178-3564 21:1-2<73 2006 21 450 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer