caa a22 4500 467948380 CHVBK 20180322200725.0 cr unu---uuuuu 170328e19861101xx s 000 0 eng 10.1007/BF00553432 doi (NATIONALLICENCE)springer-10.1007/BF00553432 (NATIONALLICENCE)springer-10.1007/BF02431615 Microstructure of porous anodic oxide films on aluminium [Elektronische Daten] [K. Wada, T. Shimohira, M. Yamada, N. Baba] Microstructure of porous anodized films of aluminium prepared in sulphuric acid solution are different from those prepared in an oxalic or phosphoric acid solution. Transmission electron microscopy reveals a multilayer or higher order structure in the former films. Infrared spectra and specific surface area were also studied for these films and new functional properties of the films suitable for new materials were found. In contrast to the fibrous colloidal structure in the cells and barrier layer in the conventional films anodized in a sulphuric acid solution at d.c. 15 V, a network structure is formed in the cells and barrier layer in the hard films prepared at higher voltage of d.c. 25 V. The microstructure changes according to the anodizing conditions. A new model for these sulphuric acid films is presented, i.e. the cell walls are constructed from five layers and the fracture of the films occurs at the centre of the cell walls. Centre barrier layer (4 to 6 nm in thickness) composed of aluminium oxide of high crystallinity was found in a barrier layer at the bottom of the pore, and the thickness is independent on the applied voltage of the anodizing. Increase in thickness of the barrier layer due to applied voltage is governed by that of the outer barrier layer. Chapman and Hall Ltd., 1986 Wada K. National Institute for Research in Inorganic Materials, Namiki, Sakura-mura, Niihari-gun, 305, Ibaraki, Japan aut Shimohira T. National Institute for Research in Inorganic Materials, Namiki, Sakura-mura, Niihari-gun, 305, Ibaraki, Japan aut Yamada M. College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, 101, Tokyo, Japan aut Baba N. Tokyo Metropolitan University, Fukasawa, Setagaya-ku, 158, Tokyo, Japan aut Journal of Materials Science Kluwer Academic Publishers 21/11(1986-11-01), 3810-3816 0022-2461 21:11<3810 1986 21 10853 https://doi.org/10.1007/BF00553432 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00553432 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Wada K. National Institute for Research in Inorganic Materials, Namiki, Sakura-mura, Niihari-gun, 305, Ibaraki, Japan aut NATIONALLICENCE 700 1- Shimohira T. National Institute for Research in Inorganic Materials, Namiki, Sakura-mura, Niihari-gun, 305, Ibaraki, Japan aut NATIONALLICENCE 700 1- Yamada M. College of Science and Technology, Nihon University, Kanda-Surugadai, Chiyoda-ku, 101, Tokyo, Japan aut NATIONALLICENCE 700 1- Baba N. Tokyo Metropolitan University, Fukasawa, Setagaya-ku, 158, Tokyo, Japan aut NATIONALLICENCE 773 0- Journal of Materials Science Kluwer Academic Publishers 21/11(1986-11-01), 3810-3816 0022-2461 21:11<3810 1986 21 10853 NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02431615 text/html Onlinezugriff via DOI Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer NATIONALLICENCE NATIONALLICENCE NL-springer