caa a22 4500 46905655X CHVBK 20180323132845.0 cr unu---uuuuu 170328e19920301xx s 000 0 eng 10.1163/156856792X00029 doi (NATIONALLICENCE)springer-10.1163/156856792X00029 Photoinduced methanol formation from methane and no at 275 k on highly dispersed vanadium oxide supported on vycor glass and its reaction intermediate species [Elektronische Daten] [M. Anpo, Y. Shioya, M. Che] UV irradiation at 275 K of the highly dispersed V/Vycor oxide catalyst in the presence of NO leads to the formation of N2 and O2. The decomposition reaction of NO proceeds photocatafytically. In the presence of CH4, UV-irradiation of the catalyst at 275 K leads to the formation of C2H6 and C2H4, but this reaction is found to accompany the reduction of the catalyst as well as the formation of CH3 radicals. A dynamic photoluminescence study of the catalyst in the absence and presence of the reactants indicates that the charge transfer excited triplet state of the surface vanadyl-species (V=O) plays a significant role in these photoinduced reactions of NO and CH4. On the other hand, UV-irradiation of the catalyst at 275 K in the presence of a mixture of NO and CH4 leads to the formation of CH3OH in addition to the above products. The higher the ratio of NO/CH4 in the mixture is, the larger the yield of CH3OH becomes and the smaller the yields of C2H6 and C2H4 become, the reaction proceeding catalytically. Thus, the present results not only imply that the highly dispersed supported vanadium oxide catalysts can be utilized as a potential photocatalyst for de-NOx-ing and/or methane activation at normal temperature but also suggest that the photo-formed oxygen species from NO molecules plays a significant role in the photoinduced CH3OH formation from CH4 and NO on V/Vycor oxide catalysts at 275 K. Springer, 1992 Anpo M. Department of Applied Chemistry, College of Engineering, University of Osaka Prefecture, 591, Sakai, Osaka, Japan aut Shioya Y. Department of Applied Chemistry, College of Engineering, University of Osaka Prefecture, 591, Sakai, Osaka, Japan aut Che M. Laboratorre de Réactivité de Surface et Structure, Université P. et M. Curie, URA 1106, CNRS, 4 Place Jussieu, Tour 54, 75252, Paris Cedex 05, France aut Research on Chemical Intermediates Springer Netherlands 17/1(1992-03-01), 15-26 0922-6168 17:1<15 1992 17 11164 https://doi.org/10.1163/156856792X00029 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1163/156856792X00029 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Anpo M. Department of Applied Chemistry, College of Engineering, University of Osaka Prefecture, 591, Sakai, Osaka, Japan aut NATIONALLICENCE 700 1- Shioya Y. Department of Applied Chemistry, College of Engineering, University of Osaka Prefecture, 591, Sakai, Osaka, Japan aut NATIONALLICENCE 700 1- Che M. Laboratorre de Réactivité de Surface et Structure, Université P. et M. Curie, URA 1106, CNRS, 4 Place Jussieu, Tour 54, 75252, Paris Cedex 05, France aut NATIONALLICENCE 773 0- Research on Chemical Intermediates Springer Netherlands 17/1(1992-03-01), 15-26 0922-6168 17:1<15 1992 17 11164 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer