caa a22 4500 469091053 CHVBK 20180323133017.0 cr unu---uuuuu 170328e19920101xx s 000 0 eng 10.1007/BF02670915 doi (NATIONALLICENCE)springer-10.1007/BF02670915 In situ deposition of Au on plasma-prepared GaAs substrates [Elektronische Daten] [Kent Choquette, M. Hong, J. Mannaerts, D. Siconolfi, R. Frankenthal, F. Baiocchi, R. Wetzel, R. Freund] In situ deposition of single crystal epitaxial and textured polycrystalline gold films on plasma-cleaned or plasma-etched GaAs substrates is accomplished in an ultrahigh vacuum integrated processing facility. Au/GaAs samples are characterized using reflection high energy electron diffraction, Auger electron spectroscopy, and ion channeling. Au crystallinity in films deposited at 100° C is shown to strongly depend on the GaAs surface cleanliness after plasma processing. Heating the substrate to 250° C after plasma processing subsequently yields epitaxial Au films; omitting the heating procedure results in polycrystalline Au films. The substrate thermal treatment removes residual physisorbed gas molecules and reaction products from the GaAs surface. Epitaxial Au films contain significantly less Ga and As on the free surface of Au than polycrystalline films, and no interaction between epitaxial Au and GaAs is observed. TMS, 1992 Epitaxial Au nationallicence Au and GaAs nationallicence integrated processing nationallicence Choquette Kent AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Hong M. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Mannaerts J. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Siconolfi D. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Frankenthal R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Baiocchi F. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Wetzel R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Freund R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 17-21 0361-5235 21:1<17 1992 21 11664 https://doi.org/10.1007/BF02670915 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02670915 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Choquette Kent AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Hong M. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Mannaerts J. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Siconolfi D. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Frankenthal R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Baiocchi F. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Wetzel R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 700 1- Freund R. AT&T Bell Laboratories, 07974, Murray Hill, NJ aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 17-21 0361-5235 21:1<17 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer