caa a22 4500 469091126 CHVBK 20180323133017.0 cr unu---uuuuu 170328e19920101xx s 000 0 eng 10.1007/BF02670932 doi (NATIONALLICENCE)springer-10.1007/BF02670932 A deep level transient spectroscopy study of rapid thermal annealed arsenic implanted silicon [Elektronische Daten] [S. Beck, R. Jaccodine, C. Clark] Deep level traps are observed in silicon that has been implanted with high doses of arsenic and subsequently annealed by rapid thermal annealing. The doses studied create enough damage to form a surface amorphous layer. Annealing temperatures, implant fluence, and the presence of a surface amorphous layer contribute to the type of trap observed. These results show evidence for a clustering/declustering mechanism of arsenic in silicon during rapid thermal annealing. TMS, 1992 Ion Implantation nationallicence damage nationallicence rapid thermal annealing nationallicence deep level defects nationallicence deep level transient spectroscopy nationallicence Beck S. Sherman Fairchild Center for Solid State Studies #161, Lehigh University, 18015, Bethlehem, PA aut Jaccodine R. Sherman Fairchild Center for Solid State Studies #161, Lehigh University, 18015, Bethlehem, PA aut Clark C. AT&T Bell Laboratories, 555 Union Blvd, 18103, Allentown, PA aut Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 125-128 0361-5235 21:1<125 1992 21 11664 https://doi.org/10.1007/BF02670932 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02670932 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Beck S. Sherman Fairchild Center for Solid State Studies #161, Lehigh University, 18015, Bethlehem, PA aut NATIONALLICENCE 700 1- Jaccodine R. Sherman Fairchild Center for Solid State Studies #161, Lehigh University, 18015, Bethlehem, PA aut NATIONALLICENCE 700 1- Clark C. AT&T Bell Laboratories, 555 Union Blvd, 18103, Allentown, PA aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 125-128 0361-5235 21:1<125 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer