caa a22 4500 469091150 CHVBK 20180323133017.0 cr unu---uuuuu 170328e19920101xx s 000 0 eng 10.1007/BF02670916 doi (NATIONALLICENCE)springer-10.1007/BF02670916 X-Ray diffraction observation of surface damage in chemical-mechanical polished gallium arsenide [Elektronische Daten] [V. Wang, R. Matyi] Two novel x-ray diffraction techniques with enhanced surface sensitivity, grazing incidence x-ray diffraction (GIXD) and inclined Bragg plane x-ray diffraction (IBXD), have been used to study surface damage in gallium arsenide (GaAs) due to bromine/methanol (Br2/MeOH) chemical mechanical (CM) polishing. A factorial design was implemented to determine the effects of four polishing variables on the surface structure of GaAs. Precise lattice parameter measurements were made in both the surface regions using GIXD and deeper into subsurface regions using IBXD after the various CM polishing treatments. Bromine concentration was found to primarily affect the surface lattice parameter, while the total polish time influenced both the surface and subsurface lattice parameters in GaAs samples that were heavily damaged prior to CM polishing. The combined effect of polishing pad rotation speed and the force exerted on the sample was found to have a much greater effect on the surface lattice parameter than either variable had alone. TMS, 1992 Chemical-mechanical polishing nationallicence GaAs nationallicence x-ray diffraction nationallicence Wang V. Materials Science Program, USA aut Matyi R. Dept. of Materials Science and Engineering, University of Wisconsin, 53706, Madison, WI aut Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 23-31 0361-5235 21:1<23 1992 21 11664 https://doi.org/10.1007/BF02670916 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02670916 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Wang V. Materials Science Program, USA aut NATIONALLICENCE 700 1- Matyi R. Dept. of Materials Science and Engineering, University of Wisconsin, 53706, Madison, WI aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/1(1992-01-01), 23-31 0361-5235 21:1<23 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer