caa a22 4500 469091681 CHVBK 20180323133019.0 cr unu---uuuuu 170328e19921201xx s 000 0 eng 10.1007/BF02667598 doi (NATIONALLICENCE)springer-10.1007/BF02667598 Abnormal grain growth in copper films during magnetically enhanced plasma processing [Elektronische Daten] [M. Naeem, H. Leary, K. Rajan] The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor. TMS, 1992 Cu films nationallicence abnormal grain growth nationallicence magnetically enhanced plasma process nationallicence Naeem M. IBM-East Fishkill Facility, Hopewell Jn., 12533, NY aut Leary H. IBM-East Fishkill Facility, Hopewell Jn., 12533, NY aut Rajan K. Mat. Engr. Dept., Rensselaer Polytechnic Inst., 12180, Troy, NY aut Journal of Electronic Materials Springer-Verlag 21/12(1992-12-01), 1087-1091 0361-5235 21:12<1087 1992 21 11664 https://doi.org/10.1007/BF02667598 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02667598 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Naeem M. IBM-East Fishkill Facility, Hopewell Jn., 12533, NY aut NATIONALLICENCE 700 1- Leary H. IBM-East Fishkill Facility, Hopewell Jn., 12533, NY aut NATIONALLICENCE 700 1- Rajan K. Mat. Engr. Dept., Rensselaer Polytechnic Inst., 12180, Troy, NY aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/12(1992-12-01), 1087-1091 0361-5235 21:12<1087 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer