caa a22 4500 469091703 CHVBK 20180323133019.0 cr unu---uuuuu 170328e19921201xx s 000 0 eng 10.1007/BF02667599 doi (NATIONALLICENCE)springer-10.1007/BF02667599 Benton J. AT&T Bell Laboratories, 07974, Murray Hill, New Jersey aut Application of defect spectroscopy to silicon processing technology [Elektronische Daten] [J. Benton] Established defect spectroscopies and silicon characterization techniques are successfully applied to device manufacturing quality control. Deep level transient spectroscopy, DLTS, and photoconducting decay recombination lifetime measurements routinely monitor epitaxial silicon. Fe and Mo are commonly observed contaminants. Processing tools, such as epitaxial reactors and ion-implantation machines, are regularly monitored for trace metals. Dislocations introduced by specific silicon processing steps are selectively studied with DLTS. Dislocation signatures are present in selectively grown epitaxial silicon as well as in shallow junctions created by BF2 implantation. As a final example, defects introduced by reactive ion etching of silicon are examined by DLTS, photol-uminescence and spreading resistance profiling. The near surface displacement damage region is a source of interstitial defects which undergo recombination enhanced diffusion to depths as great as 1 μm. Measurements previously reserved for research are now being successfully employed as monitors and controls to improve the quality of silicon microelectronic manufacturing. TMS, 1992 Si processing nationallicence defect spectroscopy nationallicence Si manufacturing nationallicence Journal of Electronic Materials Springer-Verlag 21/12(1992-12-01), 1093-1097 0361-5235 21:12<1093 1992 21 11664 https://doi.org/10.1007/BF02667599 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02667599 text/html Onlinezugriff via DOI NATIONALLICENCE 100 1- Benton J. AT&T Bell Laboratories, 07974, Murray Hill, New Jersey aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/12(1992-12-01), 1093-1097 0361-5235 21:12<1093 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer