caa a22 4500 469092416 CHVBK 20180323133021.0 cr unu---uuuuu 170328e19920501xx s 000 0 eng 10.1007/BF02655619 doi (NATIONALLICENCE)springer-10.1007/BF02655619 Formation of thermal donors in SIMOX material [Elektronische Daten] [Worth Henley, Piotr Edelman, Maria Anc] Thermal oxygen donor generation in SIMOX material formed in Czochralski (CZ) and oxygen free float zone (FZ) silicon was investigated by Hall and photoluminescence techniques. It was determined that residual interstitial oxygen was introduced to silicon by the SIMOX buried oxide formation process thus increasing the possibility of thermal donor creation. Significantly, thermal donor generation was identified and localized to the top silicon region in FZ material. The detected concentration of residual oxygen was on the order of 5 × 1013 cm-3 and is negligible when compared to the intrinsic oxygen concentration of the starting CZ bulk material. TMS, 1992 Si nationallicence SIMOX nationallicence oxygen donor nationallicence Henley Worth Center for Microelectronics Research, University of South Florida, 4202 Fowler Ave., 33620, Tampa, FL aut Edelman Piotr Center for Microelectronics Research, University of South Florida, 4202 Fowler Ave., 33620, Tampa, FL aut Anc Maria Ibis Corporation, 32 Cherry Hill Drive, 01923, Danvers, MA aut Journal of Electronic Materials Springer-Verlag 21/5(1992-05-01), 519-522 0361-5235 21:5<519 1992 21 11664 https://doi.org/10.1007/BF02655619 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02655619 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Henley Worth Center for Microelectronics Research, University of South Florida, 4202 Fowler Ave., 33620, Tampa, FL aut NATIONALLICENCE 700 1- Edelman Piotr Center for Microelectronics Research, University of South Florida, 4202 Fowler Ave., 33620, Tampa, FL aut NATIONALLICENCE 700 1- Anc Maria Ibis Corporation, 32 Cherry Hill Drive, 01923, Danvers, MA aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/5(1992-05-01), 519-522 0361-5235 21:5<519 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer