caa a22 4500 469092424 CHVBK 20180323133021.0 cr unu---uuuuu 170328e19920501xx s 000 0 eng 10.1007/BF02655620 doi (NATIONALLICENCE)springer-10.1007/BF02655620 The implementation of the power law model in silicon oxidation process simulation [Elektronische Daten] [Zhi-Min Ling, Luc Dupas, Kristin De Meyer] The purpose of this work is to extend the power-law model1 to a semi-empirical oxidation model for process simulation. The proposed model benefits from a very simple model formulation, when compared to an existing model there are fewer parameter variables and simpler expressions of parameter dependence for a wide range of oxidation conditions while maintaining a very good overall fitting accuracy. The model covers dry oxidation for different pressures, temperatures, orientations, oxidation in a HC1/O2 ambient, doping enhanced oxidation phenomena, as well as wet oxidation for different pressure, orientation and temperature conditions. To develop the model, a strategy for parameter extraction,2 combined with optimal adaptation is proposed. This approach includes two steps. One is the determination of the parameter correlation matrix and the e-indifference range for each oxidation condition(e.g. temperature). The second step is the parameter adaptation within the ε-indifference range to obtain a simple parameter variation over a wide range of oxidation conditions. As a consequence of this work, the proposed model is a possible replacement for the oxidation model of SUPREM-33 in process simulation. The optimized parameter extraction strategy can be applied to a large class of modelling problems. TMS, 1992 Si nationallicence Si oxidation nationallicence power law model nationallicence Ling Zhi-Min IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut Dupas Luc IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut De Meyer Kristin IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut Journal of Electronic Materials Springer-Verlag 21/5(1992-05-01), 523-532 0361-5235 21:5<523 1992 21 11664 https://doi.org/10.1007/BF02655620 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02655620 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Ling Zhi-Min IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut NATIONALLICENCE 700 1- Dupas Luc IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut NATIONALLICENCE 700 1- De Meyer Kristin IMEC, Kapeldreef 75, B-3030, Leuven, Heverlee, Belgium aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/5(1992-05-01), 523-532 0361-5235 21:5<523 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer