caa a22 4500 469092513 CHVBK 20180323133021.0 cr unu---uuuuu 170328e19920201xx s 000 0 eng 10.1007/BF02655838 doi (NATIONALLICENCE)springer-10.1007/BF02655838 Conducting polyheterocycle composites based on porous hosts [Elektronische Daten] [J. Park, E. Ruckenstein] Conducting composites based on porous substrates (cotton fiber, non-woven polypropylene mat and porous crosslinked polystyrene) have been prepared by a two step imbibition technique. First, the substrate was imbibed with a solution of monomer (pyrrole or bithiophene) in acetonitrile, followed by partial drying. Subsequently, the substrate was again imbibed, this time with an oxidant dissolved in a suitable solvent. The polymerization of the monomer inside the host in the presence of the oxidant and the doping of the polymer with the oxidant leads to the conducting composite. The highly hydrophobic and porous crosslinked polystyrene, prepared by the concentrated emulsion polymerization method, is the most efficient. The solvent employed for the oxidant plays a major role. A FeCl3-methanol system and porous crosslinked polystyrene lead to conductivities of polythiophene and polypyrrole based composites of 3.63 and 0.65 S/cm, respectively. Copper perchlorate and iron perchlorate are also suitable oxidants. The environmental and thermal stabilities of polypyrrole based composites are lower than those of polythiophene based composites. The thermal stability of polypyrrole based composites can be enhanced by including a small amount of an organic antioxidant, such as amides or substituted phenols, in the composite. The Mineral, Metal & Materials Society,Inc., 1992 Composite polymers nationallicence conducting polyheterocycle composites nationallicence porous hosts for conducting polymers nationallicence Park J. Department of Chemical Engineering, State University of New York at Buffalo, 14260, Amherst, New York aut Ruckenstein E. Department of Chemical Engineering, State University of New York at Buffalo, 14260, Amherst, New York aut Journal of Electronic Materials Springer-Verlag 21/2(1992-02-01), 205-215 0361-5235 21:2<205 1992 21 11664 https://doi.org/10.1007/BF02655838 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02655838 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Park J. Department of Chemical Engineering, State University of New York at Buffalo, 14260, Amherst, New York aut NATIONALLICENCE 700 1- Ruckenstein E. Department of Chemical Engineering, State University of New York at Buffalo, 14260, Amherst, New York aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/2(1992-02-01), 205-215 0361-5235 21:2<205 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer