caa a22 4500 469092521 CHVBK 20180323133021.0 cr unu---uuuuu 170328e19920201xx s 000 0 eng 10.1007/BF02655830 doi (NATIONALLICENCE)springer-10.1007/BF02655830 In-situ plasma cleaning of stainless steel III-V MOCVD growth systems [Elektronische Daten] [S. Li, G. Tompa, K. Moy, S. West, C. Nelson, R. Stall, R. Burnham, S. Smith] A plasma enhanced, in-situ, dry etching process for the cleaning of stainless steel III-V Metal Organic Chemical Vapor Deposition growth systems was investigated as a function of etchant gas, flow rate, electrode configuration, power density and plasma frequency. The plasma enhanced etching process was investigated using Ar, CH4 (5% in H2), CCl2F2 (Freon 12)/Ar and Cl2/Ar plasmas with flows varying from 5 to 25 seem. The plasma was excited using three electrode configurations, and two radio frequency generators (90-460 KHz and 13.56 MHz), singly and in combination. The plasma power was varied over the range from 200 to 700 Watts (∼0.2W/cm2 - 0.7W/cm2). The etching rates of GaAs, InP, As, and Mo were measured using a weight difference method. The Cl2/Ar plasmas exhibited etching rates typically 5 to 10 times greater than that of CCl2F2 plasmas, which in turn is several times greater than that of the other etchant gases investigated. At 400 W, elemental As etch rates, as high as ∼180μm/hr and ∼20μm/hr were achieved using Cl2 and CCl2F2 plasmas, respectively. InP/GaAs etch rates using Cl2 were ∼30μm/hr and using CCl2F2 were ∼7μm/hr. Plasma characteristics and etch rate measurements are reported. The in-situ process investigated is a safe, cost effective and an efficient method for increasing reactor uptime. The Mineral, Metal & Materials Society,Inc., 1992 Plasma cleaning nationallicence MOCVD nationallicence Li S. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut Tompa G. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut Moy K. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut West S. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut Nelson C. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut Stall R. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut Burnham R. AMOCO Research Center, Warrenville Road & Mill Street, 60566, Naperville, IL aut Smith S. AMOCO Research Center, Warrenville Road & Mill Street, 60566, Naperville, IL aut Journal of Electronic Materials Springer-Verlag 21/2(1992-02-01), 149-156 0361-5235 21:2<149 1992 21 11664 https://doi.org/10.1007/BF02655830 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02655830 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Li S. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- Tompa G. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- Moy K. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- West S. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- Nelson C. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- Stall R. EMCORE Corporation, 35 Elizabeth Avenue, 08873, Somerset, NJ aut NATIONALLICENCE 700 1- Burnham R. AMOCO Research Center, Warrenville Road & Mill Street, 60566, Naperville, IL aut NATIONALLICENCE 700 1- Smith S. AMOCO Research Center, Warrenville Road & Mill Street, 60566, Naperville, IL aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/2(1992-02-01), 149-156 0361-5235 21:2<149 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer