caa a22 4500 469092653 CHVBK 20180323133021.0 cr unu---uuuuu 170328e19921101xx s 000 0 eng 10.1007/BF02665879 doi (NATIONALLICENCE)springer-10.1007/BF02665879 Kitano T. VLSI Development Division, NEC Corporation, 1120 Shimokuzawa, Sagamihara, 229, Kanagawa, Japan aut Local structure around iron at the SiO2/Si interface [Elektronische Daten] [T. Kitano] We have investigated the local structure around iron at the SiO2/Si interface by the total-reflection fluorescence x-ray absorption fine structure technique, in conjunction with measurements of the angular dependence of x-ray fluorescence intensity. The Fe-O, Fe-Si and Fe-Fe bondings were observed around iron, in the layer formed at the SiO2/Si interface. These results show the formation of iron silicate, consisting of iron, oxygen and silicon elements. The chemical state of iron was determined from the Fe-O bond-lengths. The Fe-valence is a mixture of Fe3+ and Fe2+, mostly Fe3+. These results indicate that the layer formed at the SiO2/Si interface is iron silicate, in which a portion of Fe3+ ions were reduced. TMS, 1992 Transition metal nationallicence Kron silicate nationallicence Total-reflection XAFS nationallicence Journal of Electronic Materials Springer-Verlag 21/11(1992-11-01), 1027-1031 0361-5235 21:11<1027 1992 21 11664 https://doi.org/10.1007/BF02665879 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF02665879 text/html Onlinezugriff via DOI NATIONALLICENCE 100 1- Kitano T. VLSI Development Division, NEC Corporation, 1120 Shimokuzawa, Sagamihara, 229, Kanagawa, Japan aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer-Verlag 21/11(1992-11-01), 1027-1031 0361-5235 21:11<1027 1992 21 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer