Ion beam preparation of passivated copper integrated circuit structures for electron backscatter diffraction/orientation imaging microscopy analysis

Verfasser / Beitragende:
[Matthew Nowell]
Ort, Verlag, Jahr:
2002
Enthalten in:
Journal of Electronic Materials, 31/1(2002-01-01), 23-32
Format:
Artikel (online)
ID: 471147109