Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition

Verfasser / Beitragende:
[Shyh-Fann Ting, Yean-Kuen Fang, Wen-Tse Hsieh, Yong-Shiuan Tsair, Cheng-Nan Chang, Chun-Sheng Lin, Ming-Chun Hsieh, Hsin-Che Chiang, Jyh-Jier Ho]
Ort, Verlag, Jahr:
2002
Enthalten in:
Journal of Electronic Materials, 31/12(2002-12-01), 1341-1346
Format:
Artikel (online)
ID: 471147818