Reliability and early failure in Cu/oxide dual-damascene interconnects

Verfasser / Beitragende:
[Ennis Ogawa, Ki-Don Lee, Hideki Matsuhashi, Paul Ho, Volker Blaschke, Robert Havemann]
Ort, Verlag, Jahr:
2002
Enthalten in:
Journal of Electronic Materials, 31/10(2002-10-01), 1052-1058
Format:
Artikel (online)
ID: 471148164