Electrical and growth characteristics of Au/Al0.15Ga0.85N:Si structures with various Si incorporations

Verfasser / Beitragende:
[Cheul-Ro Lee]
Ort, Verlag, Jahr:
2002
Enthalten in:
Journal of Electronic Materials, 31/4(2002-04-01), 327-331
Format:
Artikel (online)
ID: 471148326