Dry etching of SrBi2Ta2O9: Comparison of inductively coupled plasma chemistries

Verfasser / Beitragende:
[Jin Park, Tae Kim, Chang Choi, Yoon-Bong Hahn]
Ort, Verlag, Jahr:
2002
Enthalten in:
Korean Journal of Chemical Engineering, 19/3(2002-05-01), 486-490
Format:
Artikel (online)
ID: 471152714