caa a22 4500 475763610 CHVBK 20180406123558.0 cr unu---uuuuu 170329e20000601xx s 000 0 eng 10.1007/s003960050556 doi (NATIONALLICENCE)springer-10.1007/s003960050556 Epoxy resin particles. I. Spontaneous particle formation by the polymerization reaction of epoxy resin in a stationary system using polyethers as organic media [Elektronische Daten] [K. Hibino, Y. Kimura]  A thermosetting epoxy resin was found to form polymer particles spontaneously in a stationary reaction system using polyethers as solvents. Poly(oxypropylene) and its copolymer with poly(oxyethylene) were effectively used as reaction media. The diameter of the resultant particles depended on the structure of the amines used as hardeners as well as on the molecular weight and composition of the polyether media. The glass-transition temperatures of the particles revealed that a small amount of polyether used as the medium was incorporated in the epoxy resin particles during the polymerization. Springer-Verlag Berlin Heidelberg, 2000 Key words Particle formation nationallicence Epoxy resin particles nationallicence Polyether nationallicence Stationary reaction system nationallicence Hibino K. EC Intracorporation Sanyo Chemical Industries Ltd. 11-1 Ikkyonomoto-cho Higashiyama-ku Kyoto 605-0995, Japan e-mail: hibino@mvj.biglobe.ne.jp Tel.: 81-75-541-6325 Fax: 81-75-561-5700, JP aut Kimura Y. Department of Polymer Science and Engineering Kyoto Institute of Technology Matsugasaki, Sakyo-ku Kyoto 606-8585, Japan, JP aut https://doi.org/10.1007/s003960050556 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s003960050556 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Hibino K. EC Intracorporation Sanyo Chemical Industries Ltd. 11-1 Ikkyonomoto-cho Higashiyama-ku Kyoto 605-0995, Japan e-mail: hibino@mvj.biglobe.ne.jp Tel.: 81-75-541-6325 Fax: 81-75-561-5700, JP aut NATIONALLICENCE 700 1- Kimura Y. Department of Polymer Science and Engineering Kyoto Institute of Technology Matsugasaki, Sakyo-ku Kyoto 606-8585, Japan, JP aut Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer