caa a22 4500 475791924 CHVBK 20180406123713.0 cr unu---uuuuu 170329e20000201xx s 000 0 eng 10.1007/s005420050007 doi (NATIONALLICENCE)springer-10.1007/s005420050007 Direct, high throughput LIGA for commercial applications: a progress report [Elektronische Daten] [H. Guckel, K. Fischer, E. Stiers, B. Chaudhuri, S. McNamara, M. Ramotowski, E. D. Johnson, C. Kirk] Direct LIGA; LIGA without injection molding; has the potential to become a cost effective, high throughput form of LIGA. The process requires high energy photons; near 20,000 eV; which are best produced in facilities such as the X-ray ring at Brookhaven National Laboratory. The increased absorption lengths over lower energy photons eliminates the need for a membrane type X-ray mask. This in turn facilitates very large area X-ray masks fabricated from standard silicon wafers with 20 μm gold absorbers. The absorption length increase in PMMA to 2 cm is used to implement stacked PMMA exposures in which 1 mm thick PMMA layers are used to produce exposed PMMA sheets. These sheets are eventually solvent bonded to working substrates with plating bases. New high energy X-ray masks have been developed. Two exposure stations at Brookhaven are operational. The recently commissioned manufacturing exposure station which uses a 22 inch scanner which can expose four separate PMMA-mask combination is in the testing phase. Springer-Verlag Berlin Heidelberg, 2000 Guckel H. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut Fischer K. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut Stiers E. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut Chaudhuri B. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut McNamara S. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut Ramotowski M. Brookhaven National Laboratory, Upton, NY 11973, USA, US aut Johnson E. D. Brookhaven National Laboratory, Upton, NY 11973, USA, US aut Kirk C. Quantum Devices Incorporated, Barneveld, WI 53507, USA, US aut https://doi.org/10.1007/s005420050007 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s005420050007 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Guckel H. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut NATIONALLICENCE 700 1- Fischer K. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut NATIONALLICENCE 700 1- Stiers E. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut NATIONALLICENCE 700 1- Chaudhuri B. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut NATIONALLICENCE 700 1- McNamara S. University of Wisconsin - Madison, Department of Electrical and Computer Engineering, Madison, WI 53706, USA, US aut NATIONALLICENCE 700 1- Ramotowski M. Brookhaven National Laboratory, Upton, NY 11973, USA, US aut NATIONALLICENCE 700 1- Johnson E. D. Brookhaven National Laboratory, Upton, NY 11973, USA, US aut NATIONALLICENCE 700 1- Kirk C. Quantum Devices Incorporated, Barneveld, WI 53507, USA, US aut Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer