caa a22 4500 475791940 CHVBK 20180406123713.0 cr unu---uuuuu 170329e20000201xx s 000 0 eng 10.1007/s005420050006 doi (NATIONALLICENCE)springer-10.1007/s005420050006 The influence of mask substrate thickness on exposure and development times for the LIGA process [Elektronische Daten] [S. K. Griffiths, A. Ting, J. M. Hruby] Optimizing mask substrate thickness is an important practical concern in the X-ray exposure of PMMA resists for LIGA. An overly thick substrate necessitates long exposure times due to excessive beam filtering, while a substrate too thin leads to long development times due to low absorbed doses at the PMMA bottom surface. To assist in this optimization, we have developed numerical models describing both the exposure and development of a PMMA resist. These exposure and development models are coupled in a single interactive code, permitting automated adjustment of mask substrate thickness to yield the minimum of a prescribed cost object function that depends on both the exposure and development times. Results are presented for several synchrotron sources and over a wide range of the PMMA thickness. Springer-Verlag Berlin Heidelberg, 2000 Griffiths S. K. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut Ting A. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut Hruby J. M. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut https://doi.org/10.1007/s005420050006 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s005420050006 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Griffiths S. K. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut NATIONALLICENCE 700 1- Ting A. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut NATIONALLICENCE 700 1- Hruby J. M. Sandia National Laboratories, Livermore, CA 94551-0969, USA, US aut Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer