caa a22 4500 475791983 CHVBK 20180406123713.0 cr unu---uuuuu 170329e20000201xx s 000 0 eng 10.1007/s005420050011 doi (NATIONALLICENCE)springer-10.1007/s005420050011 Large area, cost effective X-ray masks for high energy photons [Elektronische Daten] [K. Fischer, B. Chaudhuri, E. Stiers, H. Guckel] The cost effectiveness of the deep X-ray lithography and electrodeposition process, LIGA, depends directly on the throughput of the process. The use of high energy photons allows the exposure of stacked photoresist and results in high throughput. High energy X-ray exposures require a different mask than low energy X-ray exposures. The high energy mask allows a large area exposure but requires a thicker X-ray absorber. The cost of generating high energy X-ray masks can be drastically reduced by using a thick optical photoresist process rather than an X-ray exposure process. The cost can be further reduced by using alternatives to the typical X-ray absorber, gold. High atomic weight (high Z) materials are ideal absorbers. Lead has been demonstrated as being a useable alternative as an X-ray absorber. Springer-Verlag Berlin Heidelberg, 2000 Fischer K. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut Chaudhuri B. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut Stiers E. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut Guckel H. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut https://doi.org/10.1007/s005420050011 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s005420050011 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Fischer K. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut NATIONALLICENCE 700 1- Chaudhuri B. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut NATIONALLICENCE 700 1- Stiers E. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut NATIONALLICENCE 700 1- Guckel H. Department of Electrical and Computer Engineering, University of Wisconsin - Madison 1415 Engineering Drive, Madison, Wi 53706, USA, US aut Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer