caa a22 4500 475798376 CHVBK 20180406123730.0 cr unu---uuuuu 170329e20001001xx s 000 0 eng 10.1007/s001700070006 doi (NATIONALLICENCE)springer-10.1007/s001700070006 Optimising the Lithographic Patterning Effect in an Acid Copper Electroplating Process [Elektronische Daten] [Gary K. K. Poon, D.J. Williams, K.S. Chin] The effects of the average cathodic current density, electrode separation, and the active area density on the workpiece-level plating thickness variability were studied by factorial experiments for an acid copper pattern electroplating process. All the three parameters and the current densityXelectrode separation interaction were found to be significant, and an 8- term first-order prediction model was constructed and verified experimentally. The minimum variability achievable was found to increase with the active area density contrast over the board surface, and was explained by the scattering effect of the density contrast on the average plating thickness. A subsequent verification run using a simple circuit pattern showed that a composite parameter involving the overall active area density, the continuum area and the number of density contrasts, was appropriate. The possibility of further reducing the workpiece level variability by investigating the interaction effect between the overall active area density and the density contrast of the substrate was suggested.: Springer-Verlag London Limited, 2000 Keywords: Acid copper electroplating process nationallicence Design of experiments nationallicence Lithographic patterning effect nationallicence Optimisation nationallicence Poon Gary K. K. Department of Manufacturing Engineering and Enginerring Mangement, City University of Hong Kong, China, CN aut Williams D.J. School of Mechanical and Manufacturing Engineering, Loughborough University, UK, GB aut Chin K.S. Department of Manufacturing Engineering and Enginerring Mangement, City University of Hong Kong, China, CN aut https://doi.org/10.1007/s001700070006 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s001700070006 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Poon Gary K. K. Department of Manufacturing Engineering and Enginerring Mangement, City University of Hong Kong, China, CN aut NATIONALLICENCE 700 1- Williams D.J. School of Mechanical and Manufacturing Engineering, Loughborough University, UK, GB aut NATIONALLICENCE 700 1- Chin K.S. Department of Manufacturing Engineering and Enginerring Mangement, City University of Hong Kong, China, CN aut Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer