caa a22 4500 475814940 CHVBK 20180406123807.0 cr unu---uuuuu 170329e20000601xx s 000 0 eng 10.1023/A:1004072117517 doi (NATIONALLICENCE)springer-10.1023/A:1004072117517 3-Mercaptopropyltrimethoxysilane as a Cu corrosion inhibitor in KCl solution [Elektronische Daten] [R. Tremont, H. De Jesús-Cardona, J. García-Orozco, R.J. Castro, C.R. Cabrera] 3-mercaptopropyltrimethoxysilane (MPS) has been used as a copper corrosion inhibitor in 0.100 mol L−1 KCl solution. The inhibition was studied as a function of the MPS pretreatment concentration in ethanol. The MPS concentration used was between 1.0 × 10−8 mol L−1 and 1.0 × 10−1 mol L−1. A freshly-cleaned Cu electrode was inserted in an ethanolic solution of MPS for 30 min for pretreatment, and was then exposed to a 0.100 mol L−1 KCl aqueous solution for 1 h. From the polarization resistance, the inhibition efficiency improved with increase in MPS concentration during the pretreatment. The MPS adsorption on Cu followed a Langmuir adsorption behaviour. However, at MPS concentrations larger than 1.0 × 10−4 mol L−1 the inhibition decreased. Moreover, the inhibition efficiency decreased with increase in the exposure time of the MPS modified Cu electrode in the KCl aqueous solution. Polarization studies suggest that MPS is an anodic as well as a cathodic inhibitor, in the presence of dissolved oxygen. X-ray photoelectron spectroscopy (XPS) analysis of the Cu samples showed that the organic compound modifies the Cu surface and scanning electron microscopy (SEM) studies indicated that MPS protects the Cu surface when exposed for 350 h to laboratory environment. Polarized grazing angle Fourier transform-infrared (FTIR) microscopy analysis determined the presence of a polymer on the Cu surface. Kluwer Academic Publishers, 2000 copper nationallicence corrosion inhibition nationallicence 3-mercaptopropyltrimethoxysilane nationallicence Tremont R. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut De Jesús-Cardona H. Department of Chemistry, University of Puerto Rico, Bayamón Technological University College, PR 00959-1919, Bayamón aut García-Orozco J. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut Castro R.J. Department of Chemistry, University of Puerto Rico, Cayey University College, PR 00736, Cayey aut Cabrera C.R. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/6(2000-06-01), 737-743 0021-891X 30:6<737 2000 30 10800 https://doi.org/10.1023/A:1004072117517 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1004072117517 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Tremont R. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut NATIONALLICENCE 700 1- De Jesús-Cardona H. Department of Chemistry, University of Puerto Rico, Bayamón Technological University College, PR 00959-1919, Bayamón aut NATIONALLICENCE 700 1- García-Orozco J. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut NATIONALLICENCE 700 1- Castro R.J. Department of Chemistry, University of Puerto Rico, Cayey University College, PR 00736, Cayey aut NATIONALLICENCE 700 1- Cabrera C.R. Department of Chemistry, University of Puerto Rico, Río Piedras Campus, P.O. Box 23346, PR 00931-3346, San Juan aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/6(2000-06-01), 737-743 0021-891X 30:6<737 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer