caa a22 4500 475814975 CHVBK 20180406123807.0 cr unu---uuuuu 170329e20000901xx s 000 0 eng 10.1023/A:1004082301593 doi (NATIONALLICENCE)springer-10.1023/A:1004082301593 Photocatalytic degradation of oxalic acid on a semiconductive layer of n-TiO2 particles in a batch plate reactor. Part III: Rate determining steps and nonsteady diffusion model for oxygen transport [Elektronische Daten] [J. Krýsa, K. Bouzek, Ch. Stollberg] The effect of oxygen concentration on the photocatalytic degradation rate of oxalic acid on a fixed layer of TiO2 particles in a batch mode plate photoreactor was investigated at various light intensities. The regions where the photocatalytical decomposition rate is controlled by the flux of oxygen, photons, or both, were identified. For low oxygen concentration (0-0.15 mol m−3) and photon flux intensity in the range from 10 to 24 × 10−5 einstein m−2 s−1 the experimentally determined photocatalytical decomposition rate was in agreement with that theoretically calculated assuming the process to be controlled by the limiting flux of oxygen to the TiO2 surface. At higher concentrations of oxygen (0.15-0.94 mol m−3) the rate of photocatalysis was controlled simultaneously by both the flux of oxygen and photons. The influence of the oxygen concentration decreased with decreasing photon flux. For low photon flux intensities (≤3.5 × 10−5 einstein m−2 s−1), the reaction rate was controlled by the photon flux. The concentration profile of oxygen in the diffusion layer along the reactor plate was calculated and showed a significant decrease in oxygen concentration on the TiO2 surface. Kluwer Academic Publishers, 2000 n -TiO2 nationallicence oxalic acid nationallicence photocatalytic degradation nationallicence rate determining steps nationallicence Krýsa J. Department of Inorganic Technology, Technická, Institute of Chemical Technology, 5, 166 28, Prague 6, Czech Republic aut Bouzek K. Department of Inorganic Technology, Technická, Institute of Chemical Technology, 5, 166 28, Prague 6, Czech Republic aut Stollberg Ch Fachhochschule Anhalt, Fachgebiet Elektrotechnologien und Umwelttechnik, Abteilung Köthen, Bernburger Strasse 52-57, 06366, Köthen, Germany aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/9(2000-09-01), 1033-1041 0021-891X 30:9<1033 2000 30 10800 https://doi.org/10.1023/A:1004082301593 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1004082301593 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Krýsa J. Department of Inorganic Technology, Technická, Institute of Chemical Technology, 5, 166 28, Prague 6, Czech Republic aut NATIONALLICENCE 700 1- Bouzek K. Department of Inorganic Technology, Technická, Institute of Chemical Technology, 5, 166 28, Prague 6, Czech Republic aut NATIONALLICENCE 700 1- Stollberg Ch Fachhochschule Anhalt, Fachgebiet Elektrotechnologien und Umwelttechnik, Abteilung Köthen, Bernburger Strasse 52-57, 06366, Köthen, Germany aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/9(2000-09-01), 1033-1041 0021-891X 30:9<1033 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer