caa a22 4500 475815092 CHVBK 20180406123807.0 cr unu---uuuuu 170329e20000701xx s 000 0 eng 10.1023/A:1004070303697 doi (NATIONALLICENCE)springer-10.1023/A:1004070303697 Wet electrolytic oxidation of organic pollutants in wastewater treatment [Elektronische Daten] [R.M. Serikawa, M. Isaka, Q. Su, T. Usui, T. Nishimura, H. Sato, S. Hamada] Wet electrolytic oxidation of organics in the presence of electrolytes and externally added oxygen gas was investigated for wastewater treatment. The experimental apparatus was a 300 ml electrolytic batch autoclave operated mainly at 250 ∘C and 7 MPa. The results showed that the presence of halide ions such as chlorides and bromides strongly catalyses the conversion of pollutant organic compounds to innocuous compounds such as CO2 and water. The addition of external oxygen gas in wet electrolytic oxidation of acetic acid strongly suppressed the cathodic evolution of hydrogen gas and demonstrated a TOC removal profile with an apparent current efficiency higher than 100% for high concentration acetic acid solutions. Kluwer Academic Publishers, 2000 acetic acid nationallicence current efficiency nationallicence electrochemical oxidation nationallicence halide ion catalyst nationallicence wastewater treatment nationallicence wet oxidation nationallicence Serikawa R.M. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Isaka M. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Su Q. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Usui T. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Nishimura T. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Sato H. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Hamada S. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/7(2000-07-01), 875-883 0021-891X 30:7<875 2000 30 10800 https://doi.org/10.1023/A:1004070303697 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1004070303697 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Serikawa R.M. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Isaka M. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Su Q. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Usui T. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Nishimura T. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Sato H. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 700 1- Hamada S. Center for Advanced Technology, Ebara Research Co. Ltd, 4-2-1 Honfujisawa, 251-8502, Fujisawa, Japan aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/7(2000-07-01), 875-883 0021-891X 30:7<875 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer