caa a22 4500 475815335 CHVBK 20180406123808.0 cr unu---uuuuu 170329e20001201xx s 000 0 eng 10.1023/A:1026526729357 doi (NATIONALLICENCE)springer-10.1023/A:1026526729357 Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment [Elektronische Daten] [D. Gandini, E. Mahé, P.A. Michaud, W. Haenni, A. Perret, Ch. Comninellis] Thin boron-doped diamond films have been prepared by HF CVD (hot filament chemical vapour deposition technique) on conductive p-Si substrate (Si/Diamond). The morphology of these Si/diamond electrodes has been investigated by SEM and Raman spectroscopy. The electrochemical behaviour of the Si/diamond electrodes in 1 M H2SO4 and in 1 M H2SO4 + carboxylic acids has been investigated by cyclic voltammetry. Finally, the electrochemical oxidation of some simple carboxylic acids (acetic, formic, oxalic) has been investigated by bulk electrolysis. These acids can be oxidized at Si/diamond anodes to CO2, in the potential region of water and/or the supporting electrolyte decomposition, with high current efficiency. Kluwer Academic Publishers, 2000 boron-doped diamond electrodes nationallicence electrochemical oxidation nationallicence organics nationallicence wastewater treatment nationallicence Gandini D. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut Mahé E. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut Michaud P.A. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut Haenni W. CSEM Centre Suisse d'Electronique et de Microtechnique S.A, Rue Jacquet-Droz 1, CH-2007, Neuchâtel, Switzerland aut Perret A. CSEM Centre Suisse d'Electronique et de Microtechnique S.A, Rue Jacquet-Droz 1, CH-2007, Neuchâtel, Switzerland aut Comninellis Ch Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/12(2000-12-01), 1345-1350 0021-891X 30:12<1345 2000 30 10800 https://doi.org/10.1023/A:1026526729357 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1026526729357 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Gandini D. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut NATIONALLICENCE 700 1- Mahé E. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut NATIONALLICENCE 700 1- Michaud P.A. Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut NATIONALLICENCE 700 1- Haenni W. CSEM Centre Suisse d'Electronique et de Microtechnique S.A, Rue Jacquet-Droz 1, CH-2007, Neuchâtel, Switzerland aut NATIONALLICENCE 700 1- Perret A. CSEM Centre Suisse d'Electronique et de Microtechnique S.A, Rue Jacquet-Droz 1, CH-2007, Neuchâtel, Switzerland aut NATIONALLICENCE 700 1- Comninellis Ch Institute of Chemical Engineering, Swiss Federal Institute of Technology, CH-1015, Lausanne, Switzerland aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/12(2000-12-01), 1345-1350 0021-891X 30:12<1345 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer