caa a22 4500 475815475 CHVBK 20180406123808.0 cr unu---uuuuu 170329e20000301xx s 000 0 eng 10.1023/A:1003938310824 doi (NATIONALLICENCE)springer-10.1023/A:1003938310824 Electrodeposition of Ni-Co alloys from sulfamate baths [Elektronische Daten] [S. Goldbach, R. de Kermadec, F. Lapicque] The paper describes the results of electrochemical investigations of Ni-Co deposition from a sulfamate bath in the presence of boric acid and two additives. The individual deposition of nickel was shown to be partly inhibited by the adsorption of sulfamate ions at low polarization; such inhibition was not observed for cobalt. The introduction of saccharin at 100 ppm, with a wetting agent seems to hinder sulfamate adsorption and Ni deposition departs at less cathodic potentials. The presence of cobalt has no effect on nickel deposition, whereas cobalt deposition is hindered by the presence of nickel in the bath. Galvanostatic deposition was carried out at the surface of a RDE and with a rotating cylinder Hull cell. At low current densities deposits with a Co content of approx. 40% were produced, but this content was shown to decrease with the applied current density. Examination of experimental data showed that cobalt deposition is diffusion-controlled and that Co content decreases with the applied current density relative to the limiting current density. Kluwer Academic Publishers, 2000 galvanostatic deposition nationallicence impedance spectrocopy nationallicence nickel-cobalt nationallicence electrodeposition nationallicence rotating cylinder hull cell nationallicence sulfamate bath nationallicence Goldbach S. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut de Kermadec R. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut Lapicque F. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/3(2000-03-01), 277-284 0021-891X 30:3<277 2000 30 10800 https://doi.org/10.1023/A:1003938310824 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1003938310824 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Goldbach S. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut NATIONALLICENCE 700 1- de Kermadec R. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut NATIONALLICENCE 700 1- Lapicque F. Laboratoire des Sciences du Génie Chimique, CNRS-ENSIC, BP 451, F-54001, Nancy, France aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/3(2000-03-01), 277-284 0021-891X 30:3<277 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer