caa a22 4500 475815815 CHVBK 20180406123809.0 cr unu---uuuuu 170329e20000401xx s 000 0 eng 10.1023/A:1003964728030 doi (NATIONALLICENCE)springer-10.1023/A:1003964728030 Hydrogen evolving activity on nickel-molybdenum deposits using experimental strategies [Elektronische Daten] [C.-C. Hu, C.-Y. Weng] Hydrogen evolution on various Ni-Mo deposits was systematically compared using fractional factorial design (FFD) and response surface methodology (RSM). The electroplating variables such as pH, Ni/Mo atomic ratio and citrate concentration were found to be the key factors affecting the hydrogen evolution activity from the FFD study. The effects of Ni/Mo atomic ratio and citrate concentration in the plating bath on the apparent current density, the exchange current density, and the specific activity (based on i/q *) of hydrogen gas evolution, and on the Mo/(Ni + Mo) ratio of the deposits were examined using regression models. These models, represented as response surface contour plots, showed the maximum hydrogen evolving activity occurring on the Ni-Mo deposit electroplated from the bath with a pH of 8, a Ni/Mo ratio of 3.3 and a citrate concentration of 40 g l−1, respectively. Kluwer Academic Publishers, 2000 citrate electrolyte nationallicence fractional factorial design nationallicence hydrogen evolution nationallicence Ni/Mo-deposits nationallicence Hu C.-C Department of Chemical Engineering, National Chung Cheng University, 621, Chia-Yi, Taiwan aut Weng C.-Y Department of Chemical Engineering, National Chung Cheng University, 621, Chia-Yi, Taiwan aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/4(2000-04-01), 499-506 0021-891X 30:4<499 2000 30 10800 https://doi.org/10.1023/A:1003964728030 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1003964728030 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Hu C.-C Department of Chemical Engineering, National Chung Cheng University, 621, Chia-Yi, Taiwan aut NATIONALLICENCE 700 1- Weng C.-Y Department of Chemical Engineering, National Chung Cheng University, 621, Chia-Yi, Taiwan aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/4(2000-04-01), 499-506 0021-891X 30:4<499 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer