caa a22 4500 475816048 CHVBK 20180406123810.0 cr unu---uuuuu 170329e20000801xx s 000 0 eng 10.1023/A:1004047110057 doi (NATIONALLICENCE)springer-10.1023/A:1004047110057 Effect of tartrate on the morphological characteristics of the copper-tin electrodeposits from a noncyanide acid bath [Elektronische Daten] [I.A. Carlos, C.A.C. Souza, E.M.J.A. Pallone, R.H.P. Francisco, V. Cardoso, B.S. Lima-Neto] Copper and tin were electrodeposited on platinum substrates from a 1.0 M sulphuric acid plating bath in the presence and absence of tartrate. Voltammetric curves indicated two deposition processes, at −0.310 and −0.640 V, which do not shift upon addition of tartrate to the plating bath. The presence of tartrate decreased the current density in the region of the more cathodic process. The metals were electrodeposited at both deposition potentials and the deposits have the same proportions of copper and tin either with or without tartrate in the plating bath, as observed by AAS. X-ray spectra suggested that a mixture of Cu and η-Cu6Sn5 alloy was deposited at the less cathodic potential. SEM analysis showed that tartrate affects the morphology of the films. Kluwer Academic Publishers, 2000 copper-tin alloys nationallicence noncyanide bath nationallicence platinum electroplating nationallicence tartrate as additive nationallicence Carlos I.A. Departamento de Química, Universidade Federal de São Carlos, CP 676, 13565-905, São Carlos-SP, Brazil aut Souza C.A.C. Departamento de Química, Universidade Federal de São Carlos, CP 676, 13565-905, São Carlos-SP, Brazil aut Pallone E.M.J.A. Departamento de Engenharia de Materiais, UFSCar, São, Carlos-SP, Brazil aut Francisco R.H.P. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut Cardoso V. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut Lima-Neto B.S. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/8(2000-08-01), 987-994 0021-891X 30:8<987 2000 30 10800 https://doi.org/10.1023/A:1004047110057 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1004047110057 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Carlos I.A. Departamento de Química, Universidade Federal de São Carlos, CP 676, 13565-905, São Carlos-SP, Brazil aut NATIONALLICENCE 700 1- Souza C.A.C. Departamento de Química, Universidade Federal de São Carlos, CP 676, 13565-905, São Carlos-SP, Brazil aut NATIONALLICENCE 700 1- Pallone E.M.J.A. Departamento de Engenharia de Materiais, UFSCar, São, Carlos-SP, Brazil aut NATIONALLICENCE 700 1- Francisco R.H.P. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut NATIONALLICENCE 700 1- Cardoso V. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut NATIONALLICENCE 700 1- Lima-Neto B.S. Instituto de Química de São Carlos, USP, São Carlos-SP, Brazil aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/8(2000-08-01), 987-994 0021-891X 30:8<987 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer