caa a22 4500 475816536 CHVBK 20180406123811.0 cr unu---uuuuu 170329e20001101xx s 000 0 eng 10.1023/A:1026553712521 doi (NATIONALLICENCE)springer-10.1023/A:1026553712521 Electrocrystallization and electrodeposition of silver on titanium nitride [Elektronische Daten] [H. Cesiulis, M. Ziomek-Moroz] The electrocrystallization and electrodeposition of silver on TiN substrates in AgNO3 + KSCN solutions were studied by electrochemical methods and scanning electron microscopy. The description of Ag electrocrystallization is given in terms of instantaneous, progressive or mixed nucleation models. The parameters of electrocrystallization were determined and the fractional area covered by silver was estimated. A two-step procedure was used for forming a continuous silver film on a TiN substrate. During the first step, a seed layer was deposited on TiN by applying either high negative potential or cathodic current density in 0.011 M AgNO3 + 2.5 M KSCN solution. The applied cathodic current density was higher than the limiting diffusion current in the solution. During the second step, a bulk silver film was deposited galvanostatically from a 0.22 M AgNO3 + 2.5 M KSCN solution at a cathodic current density lower than the limiting current density. Kluwer Academic Publishers, 2000 electrodeposition nationallicence electrocrystallization nationallicence silver nationallicence thiocyanate nationallicence TiN substrate nationallicence Cesiulis H. Department of Physical Chemistry, Vilnius University, Naugarduko 24, Vilnius, LT-2006, Lithuania aut Ziomek-Moroz M. Department of Material Science and Engineering, Oregon Graduate Institute of Science & Technology, PO Box 91000, OR 97291-1000, Portland, USA aut Journal of Applied Electrochemistry Kluwer Academic Publishers 30/11(2000-11-01), 1261-1268 0021-891X 30:11<1261 2000 30 10800 https://doi.org/10.1023/A:1026553712521 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1026553712521 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Cesiulis H. Department of Physical Chemistry, Vilnius University, Naugarduko 24, Vilnius, LT-2006, Lithuania aut NATIONALLICENCE 700 1- Ziomek-Moroz M. Department of Material Science and Engineering, Oregon Graduate Institute of Science & Technology, PO Box 91000, OR 97291-1000, Portland, USA aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 30/11(2000-11-01), 1261-1268 0021-891X 30:11<1261 2000 30 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer