caa a22 4500 475844394 CHVBK 20180406123909.0 cr unu---uuuuu 170329e20000701xx s 000 0 eng 10.1023/A:1009091901986 doi (NATIONALLICENCE)springer-10.1023/A:1009091901986 Nano‐pits: supports for heterogeneous model catalysts prepared by interference lithograpy [Elektronische Daten] [Markus Schildenberger, Yargo Bonetti, Jens Gobrecht, Roel Prins] Nanostructured 4 inch Si wafers were prepared as new supports for model catalysts. A single wafer exhibits 109-1010 pits on an otherwise flat silicon oxide surface. To produce these nanostructures, oxidized wafers were covered with photoresist material and exposed to laser interference patterns. Using hydrofluoric acid, wet‐chemical etching of the SiO2 through the structured resist resulted in a pitted surface. The etched pits with diameters of 200-400 nm and depths between 50 and 70 nm were loaded with metal particles by evaporation (palladium, silver) or by means of spin‐coating (copper). Optimizing the methods enabled exact deposition of single metal clusters in the pits. The resulting model catalysts are remarkably stable against sintering, a major problem of conventional model catalysts when exposed to elevated temperatures and oxidizing gas atmosphere. The topography and chemical composition as well as their changes, induced by the reaction conditions applied, including stability and chemical behavior of the nanostructured systems, were investigated by means of AFM, SEM, temperature‐programmed methods and XPS. To determine their usefulness in catalysis, specially designed reactors were developed for catalytic investigations. Kluwer Academic Publishers, 2000 laser interference lithography nationallicence model catalyst nationallicence palladium nationallicence silver nationallicence copper nationallicence metal evaporation nationallicence spin‐coating nationallicence SEM nationallicence AFM nationallicence XPS nationallicence Schildenberger Markus Laboratory for Technical Chemistry, Federal Institute of Technology (ETH), 8092, Zurich, Switzerland aut Bonetti Yargo Laboratory for Micro‐ and Nanostructures, Paul Scherrer Institute (PSI), 5232, Villigen, Switzerland aut Gobrecht Jens Laboratory for Micro‐ and Nanostructures, Paul Scherrer Institute (PSI), 5232, Villigen, Switzerland aut Prins Roel Laboratory for Technical Chemistry, Federal Institute of Technology (ETH), 8092, Zurich, Switzerland aut Topics in Catalysis Kluwer Academic Publishers-Plenum Publishers 13/1-2(2000-07-01), 109-120 1022-5528 13:1-2<109 2000 13 11244 https://doi.org/10.1023/A:1009091901986 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1023/A:1009091901986 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Schildenberger Markus Laboratory for Technical Chemistry, Federal Institute of Technology (ETH), 8092, Zurich, Switzerland aut NATIONALLICENCE 700 1- Bonetti Yargo Laboratory for Micro‐ and Nanostructures, Paul Scherrer Institute (PSI), 5232, Villigen, Switzerland aut NATIONALLICENCE 700 1- Gobrecht Jens Laboratory for Micro‐ and Nanostructures, Paul Scherrer Institute (PSI), 5232, Villigen, Switzerland aut NATIONALLICENCE 700 1- Prins Roel Laboratory for Technical Chemistry, Federal Institute of Technology (ETH), 8092, Zurich, Switzerland aut NATIONALLICENCE 773 0- Topics in Catalysis Kluwer Academic Publishers-Plenum Publishers 13/1-2(2000-07-01), 109-120 1022-5528 13:1-2<109 2000 13 11244 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer