caa a22 4500 477048994 CHVBK 20180405111337.0 cr unu---uuuuu 170330e19960601xx s 000 0 eng 10.1007/BF00253466 doi (NATIONALLICENCE)springer-10.1007/BF00253466 Pulse electroplating of rich-in-tungsten thin layers of amorphous Co-W alloys [Elektronische Daten] [M. Donten, Z. Stojek] A combination of an improved plating bath and pulsed current was shown to lead to a substantial increase in tungsten content in amorphous Co-W alloys. This increase was associated with selective oxidation of cobalt during the rest times of the deposition process. The tungsten content reached 41.4 at % under the following conditions: current density 35 mA cm−2, ratio of pulse time to rest time 1/1, and pulse frequency 10 Hz. The alloy layers were of similar hardness and of much better smoothness, ductility, adhesion to the substrate, and resistance to corrosion compared to those plated according to the US 4 529 668 patent. Chapman & Hall, 1996 Donten M. Department of Chemistry, University of Warsaw, ul. Pasteura 1, 02-093, Warsaw, Poland aut Stojek Z. Department of Chemistry, University of Warsaw, ul. Pasteura 1, 02-093, Warsaw, Poland aut Journal of Applied Electrochemistry Kluwer Academic Publishers 26/6(1996-06-01), 665-672 0021-891X 26:6<665 1996 26 10800 https://doi.org/10.1007/BF00253466 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00253466 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Donten M. Department of Chemistry, University of Warsaw, ul. Pasteura 1, 02-093, Warsaw, Poland aut NATIONALLICENCE 700 1- Stojek Z. Department of Chemistry, University of Warsaw, ul. Pasteura 1, 02-093, Warsaw, Poland aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/6(1996-06-01), 665-672 0021-891X 26:6<665 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer