caa a22 4500 477049176 CHVBK 20180405111337.0 cr unu---uuuuu 170330e19960901xx s 000 0 eng 10.1007/BF00242050 doi (NATIONALLICENCE)springer-10.1007/BF00242050 Tzeng G. Department of Mathematics & Science Education, National Hualien Teachers College, 97055, Hualien, People's Republic of China aut Effect of halide ions on electroless nickel plating [Elektronische Daten] [G. Tzeng] The effect of halide ions (F−, Cl−, Br, I−) on nickel deposition in acidic electroless nickel plating baths is investigated. Halide ions were found to have a significant effect on the nickel deposition and the results could not fully be explained using mixed-potential theory. A correlation between the stability constants of halide ions with palladium (ii) ions and the plating rate is proposed to explain the observations. Various parameters, such as the activation energy, deposit microstructure and phosphorus contents of the plating bath in the presence of various halide ions, were also studied. Chapman & Hall, 1996 Journal of Applied Electrochemistry Kluwer Academic Publishers 26/9(1996-09-01), 969-975 0021-891X 26:9<969 1996 26 10800 https://doi.org/10.1007/BF00242050 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00242050 text/html Onlinezugriff via DOI NATIONALLICENCE 100 1- Tzeng G. Department of Mathematics & Science Education, National Hualien Teachers College, 97055, Hualien, People's Republic of China aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/9(1996-09-01), 969-975 0021-891X 26:9<969 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer