caa a22 4500 47705059X CHVBK 20180405111339.0 cr unu---uuuuu 170330e19960401xx s 000 0 eng 10.1007/BF00251323 doi (NATIONALLICENCE)springer-10.1007/BF00251323 Study of a mechanism of hard gold electrodeposition [Elektronische Daten] [W. Chrzanowski, Y. Li, A. Lasia] Electrodeposition of nickel hardened gold was studied from a proprietary bath (Renovel N). Linear sweep voltammetry (LSV), chronoamperometry and chronopotentiometry were employed and Tafel curves determined. LSV studies revealed formation of a current peak connected with the inhibition of the deposition reaction. In the hard gold bath Tafel curves are characterized by two slopes: −0.47 V dec.−1 between −0.5 and −0.8 V and −0.19 V dec.−1 at more negative potentials; in the soft gold bath (without Ni) these slopes are: −0.35 V dec.−1 and −0.15 V dec.−1, respectively. Current efficiency of hard gold plating in galvanostatic conditions was on the average 54-57%, depending more on current density than on the charge passed (thickness of the deposit). No influence of oxygen on the process was found. It was also found, that the bath must be activated before reproducible results are obtained. Chapman & Hall, 1996 Chrzanowski W. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Li Y. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Lasia A. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Journal of Applied Electrochemistry Kluwer Academic Publishers 26/4(1996-04-01), 385-396 0021-891X 26:4<385 1996 26 10800 https://doi.org/10.1007/BF00251323 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00251323 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Chrzanowski W. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 700 1- Li Y. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 700 1- Lasia A. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/4(1996-04-01), 385-396 0021-891X 26:4<385 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer