caa a22 4500 477050840 CHVBK 20180405111340.0 cr unu---uuuuu 170330e19960801xx s 000 0 eng 10.1007/BF00683750 doi (NATIONALLICENCE)springer-10.1007/BF00683750 Studies of platinum electroplating baths Part IV: Deposits on copper from Q bath [Elektronische Daten] [W. Basirun, D. Pletcher, A. Saraby-Reintjes] The deposition of platinum on copper from a modern commercial electroplating bath (Pt 5Q bath containing 26mm Pt(NH3)4HPO4 ⊥ ∼30 mm sodium phosphate buffer, pH 10.6 at 368 K) has been studied using voltammetry and potential step methods. In addition, polished Cu panels (area 3.4 cm2) have been electroplated using both constant potential and constant current conditions; current efficiencies have been determined and scanning electron microscopy has been used to show that the morphology of the platinum layers depends strongly on the plating conditions, particularly the potential at which deposition occurs. It is shown that good quality electroplates can be obtained with high current efficiency but a high rate deposition is more readily achieved using controlled potential. Chapman & Hall, 1996 Basirun W. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut Pletcher D. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut Saraby-Reintjes A. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut Journal of Applied Electrochemistry Kluwer Academic Publishers 26/8(1996-08-01), 873-880 0021-891X 26:8<873 1996 26 10800 https://doi.org/10.1007/BF00683750 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00683750 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Basirun W. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut NATIONALLICENCE 700 1- Pletcher D. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut NATIONALLICENCE 700 1- Saraby-Reintjes A. Department of Chemistry, The University, 017 1BJ, Southampton, Great Britain aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/8(1996-08-01), 873-880 0021-891X 26:8<873 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer