caa a22 4500 477050964 CHVBK 20180405111340.0 cr unu---uuuuu 170330e19960801xx s 000 0 eng 10.1007/BF00683747 doi (NATIONALLICENCE)springer-10.1007/BF00683747 Nucleation and crystal growth in gold electrodeposition from acid solution Part I: Soft gold [Elektronische Daten] [Y. Li, W. Chrzanowski, A. Lasia] The initial stages of gold electrodeposition on a gold electrode were studied in a proprietary bath (Renovel N) using linear sweep voltammetry and chronoamperometry. Tafel plots with two different slopes were obtained, indicating that the mechanism for gold deposition depends on potential. An inhibition phenomenon was observed during gold electrocrystallization. Experimental current-time transients were analysed using nonlinear least-squares approximations by various models of nucleation and crystal growth. The electrodeposition mechanism changes from three-dimensional progressive at lower overpotentials to three-dimensional instantaneous at higher overpotentials. Moreover, additional two-dimensional progressive or a secondary three-dimensional progressive processes take place in certain potential ranges. It was shown that the outward growth rate of the substrate's base plane displays a linear Tafel relationship whereas the vertical growth rate of gold crystals decreases at more negative potentials due to an inhibition process. Chapman & Hall, 1996 Li Y. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Chrzanowski W. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Lasia A. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut Journal of Applied Electrochemistry Kluwer Academic Publishers 26/8(1996-08-01), 843-852 0021-891X 26:8<843 1996 26 10800 https://doi.org/10.1007/BF00683747 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF00683747 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Li Y. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 700 1- Chrzanowski W. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 700 1- Lasia A. Département de Chimie, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/8(1996-08-01), 843-852 0021-891X 26:8<843 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence SWISSBIB 477050964 BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer