caa a22 4500 477051197 CHVBK 20180405111340.0 cr unu---uuuuu 170330e19960501xx s 000 0 eng 10.1007/BF01021976 doi (NATIONALLICENCE)springer-10.1007/BF01021976 Anodic oxidation of dimethyl sulfoxide based electrolyte solutions: An in situ FTIR study [Elektronische Daten] [P. Krtil, L. Kavan, I. Hoskovcová, K. Kratochvilová] Anodic oxidation of dimethyl sulfoxide (DMSO) based electrolyte solutions, containing LiClO4, LiBF4 and KPF6, on platinum (Pt), glassy carbon (GC) andn-TiO2 (anatase), electrodes was studied usingin situ Fourier transform infrared spectroscopy (FTIR). All solutions contained small amounts of H2O. Regardless of the supporting electrolyte all systems were unstable at potentials above 1.0 V vs SCE. The major oxidation product is dimethyl sulfone, formation of which is initiated by the trace water breakdown. In contrast to acetonitrile based solutions there is no evidence of electrolyte involvement in the breakdown process. Photoanodic decomposition of dimethyl sulfoxide based solutions proceeds in the same way as the anodic oxidation in the dark. In the presence of nucleophilic agent (iodides) the prevailing redox process is iodide oxidation. Small amounts of, probably, methylsulfinyliodide are also formed. The irreversible consumption of charge mediator significantly restricts the possible practical use of DMSO in photoelectrochemical devices. Chapman & Hall, 1996 Krtil P. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut Kavan L. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut Hoskovcová I. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut Kratochvilová K. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut Journal of Applied Electrochemistry Kluwer Academic Publishers 26/5(1996-05-01), 523-527 0021-891X 26:5<523 1996 26 10800 https://doi.org/10.1007/BF01021976 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF01021976 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Krtil P. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut NATIONALLICENCE 700 1- Kavan L. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut NATIONALLICENCE 700 1- Hoskovcová I. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut NATIONALLICENCE 700 1- Kratochvilová K. J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ 18223, Prague, Czech Republic aut NATIONALLICENCE 773 0- Journal of Applied Electrochemistry Kluwer Academic Publishers 26/5(1996-05-01), 523-527 0021-891X 26:5<523 1996 26 10800 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer