caa a22 4500 477122035 CHVBK 20180405111639.0 cr unu---uuuuu 170330e19960201xx s 000 0 eng 10.1007/BF03025943 doi (NATIONALLICENCE)springer-10.1007/BF03025943 Total reflection X-ray fluorescence spectroscopy using synchrotron radiation for trace impurity analysis of silicon wafer surfaces [Elektronische Daten] [C. Chang, Y. Koo, H. Padmore] One of the principal industry standard means of measuring surface and near surface wafer contamination is the total reflection X-ray fluorescence (TXRF). A TXRF experiment using synchrotron radiation is carried out at the Advance light source (ALS) beamline 10.32 to investigate the performance of synchrotron radiation based approaches for this application. The detection limit of 4.9×109 atoms/cm2 is achievable for the 3-d elements with the present ALS TXRF beamline 10.32. This is due to the greatly improved signal to background in case of the synchrotron radiation TXRF. Furthermore, there is a path to improving the synchrotron case to reach a detection limit of 7.8 × 107 atoms/cm2. Springer, 1996 Chang C. Department of Materials Science & Engineering Pohang, University of Science and Technology, 90-784, Pohang, Korea aut Koo Y. Department of Materials Science & Engineering Pohang, University of Science and Technology, 90-784, Pohang, Korea aut Padmore H. Lawrence Berkeley Laboratory, 94720, Berkeley, CA, USA aut Metals and Materials The Korean Institute of Metals and Materials 2/1(1996-02-01), 23-29 1598-9623 2:1<23 1996 2 12540 https://doi.org/10.1007/BF03025943 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/BF03025943 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Chang C. Department of Materials Science & Engineering Pohang, University of Science and Technology, 90-784, Pohang, Korea aut NATIONALLICENCE 700 1- Koo Y. Department of Materials Science & Engineering Pohang, University of Science and Technology, 90-784, Pohang, Korea aut NATIONALLICENCE 700 1- Padmore H. Lawrence Berkeley Laboratory, 94720, Berkeley, CA, USA aut NATIONALLICENCE 773 0- Metals and Materials The Korean Institute of Metals and Materials 2/1(1996-02-01), 23-29 1598-9623 2:1<23 1996 2 12540 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer