naa a22 4500 510766471 CHVBK 20180411083158.0 cr unu---uuuuu 180411e20130101xx s 000 0 eng 10.1007/s12043-012-0461-8 doi (NATIONALLICENCE)springer-10.1007/s12043-012-0461-8 Influence of argon plasma treatment on polyethersulphone surface [Elektronische Daten] [N Singh, S Pelagade, R Rane, S Mukherjee, U Deshpande, V Ganeshan, T Shripathi] Polyethersulphone (PES) was modified to improve the hydrophilicity of its surface, which in turn helps in improving its adhesive property. The modified PES surface was characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and Vicker's microhardness measurement. The contact angles of the modified PES reduces from 49° to 10° for water. The surface free energy (SFE) calculated from measured contact angles increases from 66.3 to 79.5mJ/m2 with the increase in plasma treatment time. The increase in SFE after plasma treatment is attributed to the functionalization of the polymer surface with hydrophilic groups. The XPS analysis shows that the ratio of O/C increases from 0.177 to 0.277 for modified PES polymer. AFM shows that the average surface roughness increases from 6.9nm to 23.7nm due to the increase in plasma treatment time. The microhardness of the film also increases with plasma treatment. Indian Academy of Sciences, 2012 Polyethersulphone nationallicence Ar plasma nationallicence surface energy nationallicence X-ray photoelectron spectroscopy nationallicence atomic force microscopy nationallicence microhardness nationallicence Singh N. Department of Physics, M.S. University of Baroda, 390 002, Vadodara, India aut Pelagade S. Department of Physics, M.S. University of Baroda, 390 002, Vadodara, India aut Rane R. FCIPT, Institute for Plasma Research, 382 044, Gandhinagar, India aut Mukherjee S. FCIPT, Institute for Plasma Research, 382 044, Gandhinagar, India aut Deshpande U. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut Ganeshan V. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut Shripathi T. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut Pramana Springer-Verlag 80/1(2013-01-01), 133-141 0304-4289 80:1<133 2013 80 12043 https://doi.org/10.1007/s12043-012-0461-8 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s12043-012-0461-8 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Singh N. Department of Physics, M.S. University of Baroda, 390 002, Vadodara, India aut NATIONALLICENCE 700 1- Pelagade S. Department of Physics, M.S. University of Baroda, 390 002, Vadodara, India aut NATIONALLICENCE 700 1- Rane R. FCIPT, Institute for Plasma Research, 382 044, Gandhinagar, India aut NATIONALLICENCE 700 1- Mukherjee S. FCIPT, Institute for Plasma Research, 382 044, Gandhinagar, India aut NATIONALLICENCE 700 1- Deshpande U. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut NATIONALLICENCE 700 1- Ganeshan V. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut NATIONALLICENCE 700 1- Shripathi T. UGC-DAE-CSR, University Campus, Khandawa Road, 452 017, Indore, India aut NATIONALLICENCE 773 0- Pramana Springer-Verlag 80/1(2013-01-01), 133-141 0304-4289 80:1<133 2013 80 12043 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer