naa a22 4500 510767389 CHVBK 20180411083201.0 cr unu---uuuuu 180411e20130701xx s 000 0 eng 10.1007/s12043-013-0545-0 doi (NATIONALLICENCE)springer-10.1007/s12043-013-0545-0 Microwave power coupling with electron cyclotron resonance plasma using Langmuir probe [Elektronische Daten] [S JAIN, V SENECHA, P NAIK, P HANNURKAR, S JOSHI] Electron cyclotron resonance (ECR) plasma was produced at 2.45GHz using 200-750W microwave power. The plasma was produced from argon gas at a pressure of 2 × 10 − 4 mbar. Three water-cooled solenoid coils were used to satisfy the ECR resonant conditions inside the plasma chamber. The basic parameters of plasma, such as electron density, electron temperature, floating potential, and plasma potential, were evaluated using the current-voltage curve using a Langmuir probe. The effect of microwave power coupling to the plasma was studied by varying the microwave power. It was observed that the optimum coupling to the plasma was obtained for ~600W microwave power with an average electron density of ~ 6 × 1011cm − 3 and average electron temperature of ~ 9eV. Indian Academy of Sciences, 2013 Electron cyclotron resonance plasma nationallicence Langmuir probe nationallicence electron density nationallicence electron temperature nationallicence JAIN S. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut SENECHA V. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NAIK P. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut HANNURKAR P. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut JOSHI S. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut Pramana Springer India 81/1(2013-07-01), 157-167 0304-4289 81:1<157 2013 81 12043 https://doi.org/10.1007/s12043-013-0545-0 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s12043-013-0545-0 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- JAIN S. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NATIONALLICENCE 700 1- SENECHA V. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NATIONALLICENCE 700 1- NAIK P. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NATIONALLICENCE 700 1- HANNURKAR P. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NATIONALLICENCE 700 1- JOSHI S. Raja Ramanna Centre for Advanced Technology, 452 013, Indore, India aut NATIONALLICENCE 773 0- Pramana Springer India 81/1(2013-07-01), 157-167 0304-4289 81:1<157 2013 81 12043 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer