naa a22 4500 510802427 CHVBK 20180411083401.0 cr unu---uuuuu 180411e20130701xx s 000 0 eng 10.1007/s11664-012-2438-2 doi (NATIONALLICENCE)springer-10.1007/s11664-012-2438-2 Fabrication by Coaxial-Type Vacuum Arc Evaporation Method and Characterization of Bismuth Telluride Thin Films [Elektronische Daten] [M. Uchino, K. Kato, H. Hagino, K. Miyazaki] We prepared both n- and p-type bismuth telluride thin films by using a coaxial-type vacuum arc evaporation method. The atomic compositions of the as-grown thin films and several annealed thin films were comparable to that of bulk bismuth telluride. Their thermoelectric properties were measured and found to be comparable to those of bulk materials. The Seebeck coefficient and electrical conductivity of the as-grown thin films were improved by the annealing process. The measured figures of merit (ZT) of the films were 0.86 for the n-type and 0.41 for the p-type at 300K for annealing temperatures of 573K and 523K, respectively. TMS, 2013 Thermoelectricity nationallicence coaxial-type vacuum arc evaporation method nationallicence bismuth telluride nationallicence thin film nationallicence Uchino M. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut Kato K. Lintec Corporation, 5-14-42 Nishiki-cho, 335-0005, Warabi, Saitama, Japan aut Hagino H. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut Miyazaki K. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 1814-1819 0361-5235 42:7<1814 2013 42 11664 https://doi.org/10.1007/s11664-012-2438-2 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11664-012-2438-2 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Uchino M. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut NATIONALLICENCE 700 1- Kato K. Lintec Corporation, 5-14-42 Nishiki-cho, 335-0005, Warabi, Saitama, Japan aut NATIONALLICENCE 700 1- Hagino H. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut NATIONALLICENCE 700 1- Miyazaki K. Department of Mechanical and Control Engineering, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata-ku, 804-8850, Kitakyushu, Fukuoka, Japan aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 1814-1819 0361-5235 42:7<1814 2013 42 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer