naa a22 4500 510802478 CHVBK 20180411083401.0 cr unu---uuuuu 180411e20130701xx s 000 0 eng 10.1007/s11664-012-2287-z doi (NATIONALLICENCE)springer-10.1007/s11664-012-2287-z Power Factor Characterization of Ge/SiGe Thermoelectric Superlattices at 300K [Elektronische Daten] [A. Samarelli, L. Llin, Y. Zhang, J. Weaver, P. Dobson, S. Cecchi, D. Chrastina, G. Isella, T. Etzelstorfer, J. Stangl, E. Gubler, D.J. Paul] To accurately characterize the efficiency of thermoelectric materials and characterize the maximum power that they can produce, a device using micro/nanofabrication techniques has been developed, enabling all three properties included in the figure of merit, ZT, of a thermoelectric material to be measured using a single device. The fabrication and testing of the device are presented. The electrical conductivity and Seebeck coefficient of Ge/SiGe heterostructures grown by low-energy plasma-enhanced chemical vapor deposition are used for demonstration. Experimental results as a function of quantum well width are presented, demonstrating power factors up to 6.02± 0.05mWm−1K−2 at 300K. Modeling and physical characterization demonstrate that these results are presently limited by high threading dislocation density. TMS, 2012 Thermoelectrics nationallicence electrical conductivity nationallicence Seebeck coefficient nationallicence power factor nationallicence device fabrication nationallicence SiGe nationallicence Samarelli A. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Llin L. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Zhang Y. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Weaver J. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Dobson P. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Cecchi S. L-NESS, Politecnico di Milano, Como, Italy aut Chrastina D. L-NESS, Politecnico di Milano, Como, Italy aut Isella G. L-NESS, Politecnico di Milano, Como, Italy aut Etzelstorfer T. Johannes Kepler Universitt, Linz, Austria aut Stangl J. Johannes Kepler Universitt, Linz, Austria aut Gubler E. ETH Zurich, Zurich, Switzerland aut Paul D.J. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 1449-1453 0361-5235 42:7<1449 2013 42 11664 https://doi.org/10.1007/s11664-012-2287-z text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11664-012-2287-z text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Samarelli A. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 700 1- Llin L. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 700 1- Zhang Y. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 700 1- Weaver J. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 700 1- Dobson P. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 700 1- Cecchi S. L-NESS, Politecnico di Milano, Como, Italy aut NATIONALLICENCE 700 1- Chrastina D. L-NESS, Politecnico di Milano, Como, Italy aut NATIONALLICENCE 700 1- Isella G. L-NESS, Politecnico di Milano, Como, Italy aut NATIONALLICENCE 700 1- Etzelstorfer T. Johannes Kepler Universitt, Linz, Austria aut NATIONALLICENCE 700 1- Stangl J. Johannes Kepler Universitt, Linz, Austria aut NATIONALLICENCE 700 1- Gubler E. ETH Zurich, Zurich, Switzerland aut NATIONALLICENCE 700 1- Paul D.J. University of Glasgow, School of Engineering, Rankine Building, Oakfield Avenue, G12 8LT, Glasgow, UK aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 1449-1453 0361-5235 42:7<1449 2013 42 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer