naa a22 4500 510802877 CHVBK 20180411083403.0 cr unu---uuuuu 180411e20130701xx s 000 0 eng 10.1007/s11664-013-2506-2 doi (NATIONALLICENCE)springer-10.1007/s11664-013-2506-2 Chemical Stability of (Ag,Cu)2Se: a Historical Overview [Elektronische Daten] [David Brown, Tristan Day, Thierry Caillat, G. Snyder] Recent work on Cu2−x Se has caused strong interest in this material due to its high reported peak zT (1.5) and the reduction of thermal conductivity through the mechanism of liquid-like suppression of heat capacity. In the 1960s, 3M patented Cu1.97Ag0.03Se as "TPM-217.” Over the following decade it was tested and developed by the 3M Corporation, at the National Aeronautics and Space Administration (NASA) Jet Propulsion Laboratory, Teledyne Energy Systems, and the General Atomics Corporation for use as a next-generation thermoelectric material. During these tests, extreme problems with material loss through Se vaporization and chemical reactions between the material and the device contacts were found. These problems were especially severe while operating under conditions of high $$ iL/A. $$ iL / A . As a result, the material system was abandoned. The results of these reports are discussed. A simple test of degradation of Cu2Se under conditions of applied current and thermal gradient was performed and showed results compatible with the work done by General Atomics. TMS, 2013 Brown David Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut Day Tristan Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut Caillat Thierry Jet Propulsion Laboratory/California Institute of Technology, 4800 Oak Grove Drive, 91109, Pasadena, CA, USA aut Snyder G. Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 2014-2019 0361-5235 42:7<2014 2013 42 11664 https://doi.org/10.1007/s11664-013-2506-2 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11664-013-2506-2 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Brown David Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut NATIONALLICENCE 700 1- Day Tristan Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut NATIONALLICENCE 700 1- Caillat Thierry Jet Propulsion Laboratory/California Institute of Technology, 4800 Oak Grove Drive, 91109, Pasadena, CA, USA aut NATIONALLICENCE 700 1- Snyder G. Department of Applied Physics and Materials Science, California Institute of Technology, 1200 East California Boulevard, 91125, Pasadena, CA, USA aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/7(2013-07-01), 2014-2019 0361-5235 42:7<2014 2013 42 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer