naa a22 4500 510803091 CHVBK 20180411083404.0 cr unu---uuuuu 180411e20131201xx s 000 0 eng 10.1007/s11664-013-2705-x doi (NATIONALLICENCE)springer-10.1007/s11664-013-2705-x Characterizing Corrosion Effects of Weak Organic Acids Using a Modified Bono Test [Elektronische Daten] [Yuqin Zhou, Laura Turbini, Deepchand Ramjattan, Bev Christian, Mark Pritzker] To meet environmental requirements and achieve benefits of cost-effective manufacturing, no-clean fluxes (NCFs) or low-solids fluxes have become popular in present electronic manufacturing processes. Weak organic acids (WOAs) as the activation ingredients in NCFs play an important role, especially in the current lead-free and halogen-free soldering technology era. However, no standard or uniform method exists to characterize the corrosion effects of WOAs on actual metallic circuits of printed wiring boards (PWBs). Hence, the development of an effective quantitative test method for evaluating the corrosion effects of WOAs on the PWB's metallic circuits is imperative. In this paper, the modified Bono test, which was developed to quantitatively examine the corrosion properties of flux residues, is used to characterize the corrosion effects of five WOAs (i.e., abietic acid, succinic acid, glutaric acid, adipic acid, and malic acid) on PWB metallic circuits. Experiments were performed under three temperature/humidity conditions (85°C/85% RH, 60°C/93% RH, and 40°C/93% RH) using two WOA solution concentrations. The different corrosion effects among the various WOAs were best reflected in the testing results at 40°C and 60°C. Optical microscopy was used to observe the morphology of the corroded copper tracks, and scanning electron microscopy (SEM) energy-dispersive x-ray (EDX) characterization was performed to determine the dendrite composition. TMS, 2013 Weak organic acid nationallicence Bono test nationallicence no-clean flux nationallicence dendrites nationallicence electrochemical migration nationallicence copper corrosion test nationallicence Zhou Yuqin University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut Turbini Laura University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut Ramjattan Deepchand BlackBerry, Materials Interconnect Lab, 25 Reuter Drive, N3E 1A9, Cambridge, ON, Canada aut Christian Bev BlackBerry, Materials Interconnect Lab, 25 Reuter Drive, N3E 1A9, Cambridge, ON, Canada aut Pritzker Mark University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/12(2013-12-01), 3609-3619 0361-5235 42:12<3609 2013 42 11664 https://doi.org/10.1007/s11664-013-2705-x text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11664-013-2705-x text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Zhou Yuqin University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut NATIONALLICENCE 700 1- Turbini Laura University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut NATIONALLICENCE 700 1- Ramjattan Deepchand BlackBerry, Materials Interconnect Lab, 25 Reuter Drive, N3E 1A9, Cambridge, ON, Canada aut NATIONALLICENCE 700 1- Christian Bev BlackBerry, Materials Interconnect Lab, 25 Reuter Drive, N3E 1A9, Cambridge, ON, Canada aut NATIONALLICENCE 700 1- Pritzker Mark University of Waterloo, 200 University Avenue West, N2L 3G1, Waterloo, ON, Canada aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/12(2013-12-01), 3609-3619 0361-5235 42:12<3609 2013 42 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer