naa a22 4500 510805353 CHVBK 20180411083415.0 cr unu---uuuuu 180411e20131101xx s 000 0 eng 10.1007/s11664-013-2625-9 doi (NATIONALLICENCE)springer-10.1007/s11664-013-2625-9 A Slightly Oxidizing Etchant for Polishing of CdTe and CdZnTe Surfaces [Elektronische Daten] [V. Ivanits'ka, P. Moravec, V. Tomashik, K. Mašek, Z. Tomashik, J. Franc, R. Grill, P. Höschl] New iodine-evolving etching solutions were developed for surface treatment of CdTe and CdZnTe crystals. The nature of the chemical dissolution of CdTe samples with (100), (110), and (111) orientations, and also of (211) Cd0.96Zn0.04Te samples, in KIO3-KI-lactic acid solution was studied. It was established that this dissolution is diffusion controlled. Surface roughness measurements revealed highly polishing properties of the etchant. A study of the chemical composition and structure of the (211)B Cd0.96Zn0.04Te surfaces etched under different conditions was carried out. The thickness of the Te oxide layer was evaluated in the course of heating in vacuum. KIO3-KI-lactic acid treatment appears to be preferable in terms of elimination of Te oxides from the surface as compared with standard Br2-methanol solution. The etching compositions were shown to be useful for chemical polishing of CdTe-based surfaces. TMS, 2013 CdTe nationallicence CdZnTe nationallicence chemical etching nationallicence chemical polishing nationallicence XPS nationallicence RHEED nationallicence Ivanits'ka V. Yurii Fed'kovych National University, Chernivtsi, Ukraine aut Moravec P. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut Tomashik V. V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine aut Mašek K. Faculty of Mathematics and Physics, Department of Surface and Plasma Science, Charles University, Prague, Czech Republic aut Tomashik Z. V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine aut Franc J. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut Grill R. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut Höschl P. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/11(2013-11-01), 3059-3065 0361-5235 42:11<3059 2013 42 11664 https://doi.org/10.1007/s11664-013-2625-9 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11664-013-2625-9 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Ivanits'ka V. Yurii Fed'kovych National University, Chernivtsi, Ukraine aut NATIONALLICENCE 700 1- Moravec P. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut NATIONALLICENCE 700 1- Tomashik V. V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine aut NATIONALLICENCE 700 1- Mašek K. Faculty of Mathematics and Physics, Department of Surface and Plasma Science, Charles University, Prague, Czech Republic aut NATIONALLICENCE 700 1- Tomashik Z. V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev, Ukraine aut NATIONALLICENCE 700 1- Franc J. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut NATIONALLICENCE 700 1- Grill R. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut NATIONALLICENCE 700 1- Höschl P. Faculty of Mathematics and Physics, Institute of Physics, Charles University, Ke Karlovu 5, 121 16, Prague 2, Czech Republic aut NATIONALLICENCE 773 0- Journal of Electronic Materials Springer US; http://www.springer-ny.com 42/11(2013-11-01), 3059-3065 0361-5235 42:11<3059 2013 42 11664 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer