naa a22 4500 510816428 CHVBK 20180411083509.0 cr unu---uuuuu 180411e20131201xx s 000 0 eng 10.1007/s11468-013-9584-0 doi (NATIONALLICENCE)springer-10.1007/s11468-013-9584-0 Nonlinear Plasmonics: Four-photon Near-field Photolithography using Optical Antennas [Elektronische Daten] [Hao Jiang, Reuven Gordon] Recent experiments on four-photon nonlinear exposure of photoresist near nanoplasmonic structures raise a question: What nonlinear processes are responsible for the observed profile? Here, we study the nonlinear exposure of poly(methyl methacrylate) (PMMA) in the near-field of gold nanoantennas. We consider six possible nonlinear processes and study them in terms of the developed volumes and the exposure profiles in photoresist. We find that the direct fourth harmonic generation (4HG) in gold is the dominant nonlinear process. The developed volume from 4HG and the exposure profiles both match closely with the experiments. The next strongest process is direct four-photon absorption (4PA) in PMMA. The strength of 4PA process is about one order of magnitude weaker than 4HG. The developed volume and exposure profiles predicted from 4PA process clearly deviate from experiments. Springer Science+Business Media New York, 2013 Nanoplasmonics nationallicence Optical antennas nationallicence Near-field lithography nationallicence Fourth harmonic generation nationallicence Nonlinear optics nationallicence Jiang Hao Department of Electrical and Computer Engineering, University of Victoria, V8P5C2, Victoria, British Columbia, Canada aut Gordon Reuven Department of Electrical and Computer Engineering, University of Victoria, V8P5C2, Victoria, British Columbia, Canada aut Plasmonics Springer US; http://www.springer-ny.com 8/4(2013-12-01), 1655-1665 1557-1955 8:4<1655 2013 8 11468 https://doi.org/10.1007/s11468-013-9584-0 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11468-013-9584-0 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Jiang Hao Department of Electrical and Computer Engineering, University of Victoria, V8P5C2, Victoria, British Columbia, Canada aut NATIONALLICENCE 700 1- Gordon Reuven Department of Electrical and Computer Engineering, University of Victoria, V8P5C2, Victoria, British Columbia, Canada aut NATIONALLICENCE 773 0- Plasmonics Springer US; http://www.springer-ny.com 8/4(2013-12-01), 1655-1665 1557-1955 8:4<1655 2013 8 11468 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer